Spacer Engineered FinFET Architectures: High-Performance Digital Circuit Applications
Jun 2017 · CRC Press
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154
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About this ebook
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
About the author
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
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